Charge Exchange Processes During Metal Deposition on Silicon From Fluoride Solutions

Charge Exchange Processes During Metal Deposition on Silicon From Fluoride Solutions

著者名:

掲載資料名:

Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-9

発行年:

1999

開始ページ:

160

終了ページ:

167

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772310 [1566772311]

言語:

英語

請求記号:

E23400/99-9

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013939
シリーズID:	PA00000028
会議名:	Symposium on Electrochemical processing in ULSI fabrication and semiconductor/metal deposition
回次:	2nd
会議開催地:	Seattle, Washington, USA
会議開催年:	1999.05.03-1999.05.06

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