1.

国際会議録
国際会議録
1. Binary Cr etch process control directed at the 45nm node [6283-25]
Plumhoff, J. ; Westernman, R. ; Constantine, C.
出版情報: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6283
2.

国際会議録
国際会議録
2. Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
Plumhoff, J. ; Constantine, C. ; Shin, J. ; Reelfs, B. ; Rausa, E. ; Benz, J.M. ; Hibbs, M.S. ; Brunner, T.A.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.253-263,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
3.

国際会議録
国際会議録
3. Improving feature-size linearity for alternating phase-shift mask applications utilizing a next-generation ICP source
Shin, J. ; Constantine, C. ; Plumhoff, J. ; Rausa, E.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.679-683,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
4.

国際会議録
国際会議録
4. Improvements in MoSi EAPSM CD bias and iso-dense linearity plasma etch results utilizing design of experiments process optimization of Gen III ICP plasma source
Plumhoff, J. ; Constantine, C. ; Shin, J. ; Rausa, E.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.291-302,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
5.

国際会議録
国際会議録
5. Quartz etch process to improve etch depth linearity and uniformity using Mask Etcher IV
Srinivasan, S. ; Plumhoff, J. ; Westerman, R. ; Johnson, D. J. ; Constantine, C.
出版情報: 24th Annual BACUS Symposium on Photomask Technology.  pp.176-182,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5567
6.

国際会議録
国際会議録
6. Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks
Plumhoff, J. ; Constantine, C. ; Reelfs, B.H.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.88-93,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446
7.

国際会議録
国際会議録
7. 90-nm mask making processes using the positive tone chemically amplified resist FEP171
Butschke, J. ; Beyer, D. ; Constantine, C. ; Dress, P. ; Hudek, P. ; Irmscher, M. ; Koepernik, C. ; Krauss, C. ; Plumhoff, J. ; Voehringer, P.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.344-354,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
8.

国際会議録
国際会議録
8. Improvements in binary chrome CD performance utilizing an optimized 4th-generation reactor platform
Plumhoff, J. ; Constantine, C. ; Shin, J. ; Reelfs, B. ; Rausa, E.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.736-743,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
9.

国際会議録
国際会議録
9. Controlling CD uniformity for 45nm technology node applications [6349-10]
Plumhoff, J. ; Srinivasan, S. ; Westerman, R. ; Johnson, D. ; Constantine, C.
出版情報: Photomask Technology 2006.  pp.63490A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6349
10.

国際会議録
国際会議録
10. Quartz etch process for alternating aperture phase shift masks (alt-APSM) [5853-20]
Srinivasan, S. ; Westerman, R. ; Plumhoff, J. ; Johnson, D. ; Constantine, C.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.432-437,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853