1.

国際会議録
国際会議録
1. Application of cellular neural networks in the measurement of Iinewidth and line edge roughness [6150-115]
Li, H. ; Zhao, X. ; Chu, W. ; Li, N.
出版情報: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment.  pp.61504S-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6150
2.

国際会議録
国際会議録
2. An image stitching method to eliminate the distortion of the sidewall in linewidth measurement
Zhao, X. ; Fu, J. ; Chu, W. ; Nguyen, C. ; Vorburger, T.V.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.363-373,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375
3.

国際会議録
国際会議録
3. Study of an image stitching method for linewidth measurement
Chu, W. ; Zhao, X. ; Fu, J. ; Vorburger, T.V.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.776-783,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446