1.

国際会議録
国際会議録
1. The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning
Higashi, G.S. ; Chabal, Y.J. ; Raghavachari, K. ; Becker, R.S. ; Green, M.P. ; Hanson, K. ; Boone, T. ; Eisenberg, J.H. ; Shive, S.F. ; DiBello, G.N. ; Fulford, K.L.
出版情報: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.189-198,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-13
2.

国際会議録
国際会議録
2. INFRARED SPECTROSCOPY OF Si (111) AND Si (100) SURFACES AFTER HF TREATMENT: HYDROGEN TERMINATION AND SURFACE MORPHOLOGY
Chabal, Y.J. ; Higashi, G.S. ; Raghavachari, K.
出版情報: Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A..  pp.191-196,  1989.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 131
3.

国際会議録
国際会議録
3. Spectroscopic and Theoretical Investigations of Hydrogen-Induced Exfoliation of Silicon: Si-H Bending Modes
Caudano, Y. ; Weldon, M.K. ; Chabal, Y.J. ; Stefanov, B.B. ; Raghavachari, K. ; Jacobson, D.C. ; Christman, S.B. ; Chaban, E.E.
出版情報: Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications.  pp.365-372,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-36