1.

国際会議録
国際会議録
1. The Future of Silicide for CMOS Contacts
Roy, R. A. ; Cabral, C., Jr. ; Lavoie, C.
出版情報: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.35-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 564
2.

国際会議録
国際会議録
2. Light Scattering Measurement of Surface Topography During Formation of Titanium Silicide
Lavoie, C. ; Cabral, C., Jr. ; Clevenger, L. A. ; Harper, J. M. E. ; Jordan-Sweet, J. ; Saenger, K. L. ; Doany, F.
出版情報: Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.163-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 406
3.

国際会議録
国際会議録
3. Classification of the Modes of Dissociation in Immiscible Cu-Alloy Thin Films
Barmak, K. ; Lucadamo, G. A. ; Cabral, C., Jr. ; Lavoie, C. ; Harper, J. M. E.
出版情報: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.341-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 564
4.

国際会議録
国際会議録
4. Surface Roughening During Titanium Silicide Formation: A Comparison Between Si(100) and Poly-Si Substrates
Lavoie, C. ; Martel, R. ; Cabral, C., Jr. ; Clevenger, L. A. ; Harper, J. M. E.
出版情報: Structure and evolution of surfaces : symposium held December 2-5, 1996, Boston, Massachusette, U.S.A..  pp.389-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 440
5.

国際会議録
国際会議録
5. In Situ TEM Analysis of TiSi2 C49-C54 Transformations During Annealing
Gignac, L. M. ; Svilan, V. ; Clevenger, L. A. ; Cabral, C., Jr. ; Lavoie, C.
出版情報: Thin films - structure and morphology : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A..  pp.255-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 441
6.

国際会議録
国際会議録
6. A Self-Aligned Silicide Process Utilizing Ion Implants For Reduced Silicon Consumption And Control Of The Silicide Formation Temperature
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.35-40,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
7.

国際会議録
国際会議録
7. In-situ Studies of Silicide Formation in Ti-Ta Bilayer Thin Films on Poly-Si
Ozcan, A.S. ; Ludwig K.F., Jr. ; Lavoie, C. ; Cabral, C., Jr. ; Harper, J.M.E.
出版情報: Magnetic and electronic films : microstructure, texture and application to data storage : symposium held April 1-4, 2002, San Francisco, California, U.S.A..  pp.43-50,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 721
8.

国際会議録
国際会議録
8. A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
出版情報: Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A..  pp.89-94,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 686
9.

国際会議録
国際会議録
9. The Growth Of Tantalum Thin Films By Plasma-Enhanced Atomic Layer Deposition And Diffusion Barrier Properties
Kim, H. ; Cabral, C., Jr. ; Lavoie, C. ; Rossnagel, S.M.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.407-412,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
10.

国際会議録
国際会議録
10. Dependence of Crystallographic Texture of C54 TiSi2 on Thickness and Linewidth in Submicron CMOS Structures
Svilan, V. ; Rodbell, K. P. ; Clevenger, L. A. ; Cabral, C., Jr. ; Roy, R. A. ; Lavoie, C. ; Jordan-Sweet, J. ; Harper, J. M. E.
出版情報: Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A..  pp.53-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 427