In Situ Analysis of the Formation of Thin TiSi2 (<50 nm) Contacts in Submicron CMOS Structures During Rapid Thermal Annealing
- 著者名:
Clevenger, L. A. Cabral, C., Jr Roy, R. A. Lavoie, C. Viswanathan, R. Saenger, K. L. Jordan-Sweet, J. Morales, G. Ludwig, K. L., Jr Stephenson, G. B. - 掲載資料名:
- Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 402
- 発行年:
- 1996
- 開始ページ:
- 257
- 出版情報:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- 言語:
- 英語
- 請求記号:
- M23500/402
- 資料種別:
- 国際会議録
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