1.

国際会議録
国際会議録
1. Localized Charge Injection-A Tool to Investigate Plasma Damage in CMOS Devices
Viswanathan,C.R. ; Rao,V.Ramgopal ; Brozek,T.
出版情報: Physics of - Semiconductor Devices -.  Part 2  pp.980-985,  1998.  New Delhi.  Narosa Publishing House
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3316
2.

国際会議録
国際会議録
2. In-line testing of antenna-type test structures for separation of sources of process-induced damage
Brozek,T. ; Roberts,D. ; Dao,T.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing.  pp.101-108,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3215
3.

国際会議録
国際会議録
3. Sensitivity of polysilicon and polycide antenna MOS capacitor to ion implantation charging effects
Brozek,T. ; Norton,C.
出版情報: Process Control and Diagnostics.  pp.66-71,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4182