Sensitivity of polysilicon and polycide antenna MOS capacitor to ion implantation charging effects
- 著者名:
- 掲載資料名:
- Process Control and Diagnostics
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4182
- 発行年:
- 2000
- 開始ページ:
- 66
- 終了ページ:
- 71
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438430 [081943843X]
- 言語:
- 英語
- 請求記号:
- P63600/4182
- 資料種別:
- 国際会議録
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*CHARACTERIZATION AND CONTROL OF WAFER CHARGING EFFECTS DURING HIGH-CURRENT ION IMPLANTATION
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In-line testing of antenna-type test structures for separation of sources of process-induced damage
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