1.

国際会議録
国際会議録
1. Incorporation of Hydrogen in SiO2 and Si3N4 Thin Films Deposited by ECR-CVD
Brown, J. ; Boudreau, M. ; Boumerzoug, M. ; Mascher, P. ; Jackman, T. E. ; Tong, S. Y. ; Haugen, H.
出版情報: Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A..  pp.1037-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 378
2.

国際会議録
国際会議録
2. Passivation Studies on AlGaAs Surfaces Suitable for High Power Laser Development
Edirisinghe, C. ; Ruda, H. E. ; Koutzarov, I. ; Liu, Q. ; Jedral, L. ; Boudreau, M. G. ; Boumerzoug, M. ; Brown, J. ; Mascher, P. ; Moore, A. ; Henderson, R.
出版情報: Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A..  pp.1007-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 378