IN-SITU X-RAY DIFFRACTION AND RESISTIVITY ANALYSIS OF CoSi2 PHASE FORMATION WITH AND WITHOUT A Ti INTERLAYER AT RAPID THERMAL ANNEALING RATES
- 著者名:
Cabral, C., Jr. Clevenger, L. A. Stephenson, G. B. Brauer, S. Morales, G. Ludwig, K. F., Jr. - 掲載資料名:
- Applications of synchrotron radiation techniques to materials science II : symposium held November 27-December 2, 1994, Boston, Massachusetts, USA
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 375
- 発行年:
- 1995
- 開始ページ:
- 253
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992771 [1558992774]
- 言語:
- 英語
- 請求記号:
- M23500/375
- 資料種別:
- 国際会議録
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