1.

国際会議録
国際会議録
1. MATERIAL PROPERTIES OF GaAs-ON-Si AND FABRICATION OF DIGITAL INTEGRATED CIRCUITS
Chand, N. ; Ren, F. ; Chu, S.N.G. ; Sergent, A.M. ; Boone, T. ; Lang, D.V.
出版情報: Heteroepitaxy on silicon : fundamentals, structure, and devices : symposium held April 5-8, 1988, Reno, Nevada, U.S.A..  pp.205-212,  1988.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 116
2.

国際会議録
国際会議録
2. Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES
Liu, J.Q. ; Lee, C. ; Rosamilia, J.M. ; Boone, T. ; Higashi, G.S.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.552-559,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
3.

国際会議録
国際会議録
3. The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning
Higashi, G.S. ; Chabal, Y.J. ; Raghavachari, K. ; Becker, R.S. ; Green, M.P. ; Hanson, K. ; Boone, T. ; Eisenberg, J.H. ; Shive, S.F. ; DiBello, G.N. ; Fulford, K.L.
出版情報: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.189-198,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-13
4.

国際会議録
国際会議録
4. THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS
Chang, J.P. ; Sapjeta, J. ; Rosamilia, J.M. ; Boone, T. ; Eng, J., Jr. ; Opila, R.L. ; Brennan, S. ; Wiemer, C. ; Pianetta, P.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.17-24,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
5.

国際会議録
国際会議録
5. *INTERFACIAL MICROSTRUCTURE AND CARRIER CONDUCTION PROCESS IN Pt/Ti OHMIC CONTACT TO p-In0.53Ga0.47As FORMED BY RAPID THERMAL PROCESSING
Chu, S. N. G. ; Katz, A. ; Boone, T. ; Thomas, P. M. ; Riggs, V. G. ; Dautremont-Smith, W. C. ; Johnson Jr., W. D.
出版情報: Advanced metallizations in microelectronics : symposium held April 16-20, 1990, San Francisco, California, U.S.A..  pp.389-400,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 181
6.

国際会議録
国際会議録
6. Effect of Cobalt and Copper Contamination on the Electrical Properties
Benton, J. ; Boone, T. ; Jacobson, D. ; Silverman, P. ; Rafferty, C. ; Weinzierl, S. ; Vu, B.
出版情報: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.278-286,  2000.  Bellingham, Wash..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-17
7.

国際会議録
国際会議録
7. ON THE DEFECT STRUCTURE OF GRAIN BOUNDARIES IN Ba2YCu3O7-x
Nakahara, S. ; Fisanick, G. J. ; Yan, M. F. ; van Dover, R. B. ; Boone, T. ; Moore, R.
出版情報: High-temperature superconductors : symposium held November 30-December 4, 1987, Boston, Massachusetts, U.S.A..  pp.575-578,  1988.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 99
8.

国際会議録
国際会議録
8. Microcellular Materials Using SAN:PEOx Blends
Boone, T.
出版情報: ANTEC 88, Atlanta, April 18-21, 1988, Conference proceedings : plastics are shaping tomorrow today : Society of Plastics Engineers 46th annual technical conference & exhibits.  pp.1873-1876,  1988.  Brookfield, CT.  Society of Plastics Engineers, Inc. (SPE)
シリーズ名: Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
シリーズ巻号: 34
9.

国際会議録
国際会議録
9. MEASURING VACANCY DIFFUSIVITY AND VACANCY ASSISTED CLUSTERING BY NITRIDATION ENHANCED DIFFUSION OF Sb IN Si(100) DOPING SUPERLATTICES
Mogi, Toshiharu K. ; Gossmann, H.-J. ; Rafferty, C. S. ; Luftman, H. S. ; Unterwald, F. C. ; Boone, T. ; Thompson, Michael O. ; Poate, J. M.
出版情報: Evolution of thin film and surface structure and morphology : symposium held November 28-December 2, 1994, Boston, Massachusetts, USA.  pp.157-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 355
10.

国際会議録
国際会議録
10. A COMPARISON OF THE ROUGHNESS OF VARIOUS Si/SiO2 INTERFACES USING SYNCHROTRON X-RAY DIFFRACTION
Tang, Mau-Tsu ; Evans-Lutterodt, K. W. ; Higashi, G. S. ; Boone, T.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.399-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
11.

国際会議録
国際会議録
11. Hot Water Etching of Silicon Surfaces: New Insights of Mechanistic Understanding and Implications to Device Fabrication
Rosamilia, J. M. ; Boone, T. ; Sapjeta, J. ; Raghavachari, K. ; Higashi, G. S. ; Liu, Q.
出版情報: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.181-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 477
12.

国際会議録
国際会議録
12. HF-IMMERSION INDUCTIVELY COUPLED CARRIER LIFETIME CHARACTERIZATION OF FURNACE-OXIDE GROWTH
Boone, T. ; Higashi, G. S. ; Benton, J. L. ; Kistler, R. C. ; Weber, G. R. ; Keller, R. C. ; Makris, G.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.359-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
13.

国際会議録
国際会議録
13. ION IMPLANTED CALIBRATION STANDARDS FOR Si SURFACE CONTAMINATION DETECTION BY TXRF
Jacobson, D. C. ; Poate, J. M. ; Higashi, G. S. ; Boone, T. ; Eaglesham, D. J. ; Hockett, Richard
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.347-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
14.

国際会議録
国際会議録
14. EFFECT OF TEMPERATURE CYCLES ON THE CRITICAL CURRENT DENSITY OF YBa2Cu3O7-δ
Tiefel, T. H. ; Jin, S. ; Sherwood, R. C. ; Fastnacht, R. A. ; Nakahara, S. ; Fisanick, G. ; Boone, T.
出版情報: High-temperature superconductors : symposium held November 30-December 4, 1987, Boston, Massachusetts, U.S.A..  pp.365-370,  1988.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 99
15.

国際会議録
国際会議録
15. GROWTH OF SINGLE CRYSTAL TYPE A AND TYPE B CoXNi1-XSi2 LAYERS ON Si (111)
Tung, R. T. ; Heliman, F. ; Gibson, J. M. ; Boone, T.
出版情報: Heteroepitaxy on silicon II : symposium held April 21-23, 1987, Anaheim, California, U.S.A..  pp.451-456,  1987.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 91
16.

国際会議録
国際会議録
16. Metal contamination issues resulting from new Si processes
Benton, J. L. ; Boone, T. ; Jacobson, D.C. ; Lin, Wen ; Wilk, G.D. ; Krautter, H. W. ; Rosamilia, J.M. ; Rafferty, C.S.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany.  pp.181-191,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-29
17.

国際会議録
国際会議録
17. Multiwell Microfluidic Plates for Evaporation-controlled Sub-microliter Assays Design and Results
Vanysek, P. ; Boone, T. ; Dang, T. ; Geiger, H. ; Zhao, M. ; Klapperich, C. ; Lee, H. ; Nicewarner, D. ; Kurnik, R. ; Singh, S. ; Xiao, V.
出版情報: Chemical and biological sensors and analytical methods II : proceedings of the international symposium.  pp.376-383,  2001.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-18
18.

国際会議録
国際会議録
18. Simulation of Transient Isotachophoresis (Stacking) for Concentration of Samples in a Microfluidic Device
Kumik, R. ; Boone, T. ; Gibbons, I. ; Wei, J. ; Williams, S.
出版情報: Chemical and biological sensors and analytical methods II : proceedings of the international symposium.  pp.384-387,  2001.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-18
19.

国際会議録
国際会議録
19. DETECTION OF PROCESS INDUCED DISLOCATIONS IN SILICON
Benton, J.L. ; Higashi, G.S. ; Boone, T.
出版情報: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.1117-1122,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-10
20.

国際会議録
国際会議録
20. EFFECT OF HOT WATER EXPOSURE ON BARE SILICON SURFACES IN MOS PROCESSING
Eisenberg, J. H. ; Shive, S. F. ; Stevie, F. ; Higashi, G. S. ; Boone, T. ; Hanson, K. ; Sapjeta, J. B. ; DiBello, G. N. ; Fulford, K. L.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.485-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
21.

国際会議録
国際会議録
21. Minimization of Interfacial Microroughness for 13-60 ｢？Ultrathin Gate Oxides
Sapjeta, J. ; Boone, T. ; Rosamilia, J. M. ; Silverman, P. J. ; Sorsch, T. W. ; Timp, G. ; Weir, B. E.
出版情報: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.203-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 477
22.

国際会議録
国際会議録
22. 6 Cleaning Technology in Semiconductor Device Manufacturing: Approaches to Environmentally Responsible Processing
Rosamillia, J.M. ; Boone, T. ; Higashi, G.S.
出版情報: Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics.  pp.68-82,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-21
23.

国際会議録
国際会議録
23. Influence Of Vacuum Annealing on Native Si Point Defects
Gossmann, H.-J. ; Mogi, T.K. ; Rafferty, C.S. ; Stolk, P.A. ; Eaglesham, D.J. ; Luftman, H.S. ; Unterwald, F.C. ; Boone, T. ; Thompson, M.O. ; Poate, J.M.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.177-186,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
24.

国際会議録
国際会議録
24. Dopant Diffusion in Si(100) Doping Superlattices During Thermal Nitridation and Vacancy Assisted Sb Precipitation
Mogi, T.K. ; Gossmann, H-J. ; Eaglesham, D.J. ; Rafferty, C.S. ; Lufiman, H.S. ; Unterwald, F.C. ; Boone, T. ; Poate, J.M. ; Thompson, M.O.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.145-152,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
25.

国際会議録
国際会議録
25. Rapid Technique for Determination of Si/SiO2 and Si/Si-O-N Interface State Densities Based on Measurement of Recombination Lifetimes
Green, M.L. ; Sachse, J.-U. ; Higashi, G. ; Feldman, L.C. ; Boone, T. ; Brasen, D.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.555-567,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1
26.

国際会議録
国際会議録
26. Influence of Flouring and BF2 Implants on the Transient Enhanced Diffusion of Boron
Vuong, H-H. ; Gossmann, H.-J. ; Rafferty, C.S. ; Luftman, H.S. ; Unterwald, F.C. ; Jacobson, D.C. ; Ahrens, R.E ; Boone, T. ; Zeitzoff, P.M.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.6-12,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5