1.

国際会議録
国際会議録
1. Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES
Liu, J.Q. ; Lee, C. ; Rosamilia, J.M. ; Boone, T. ; Higashi, G.S.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.552-559,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
2.

国際会議録
国際会議録
2. THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS
Chang, J.P. ; Sapjeta, J. ; Rosamilia, J.M. ; Boone, T. ; Eng, J., Jr. ; Opila, R.L. ; Brennan, S. ; Wiemer, C. ; Pianetta, P.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.17-24,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
3.

国際会議録
国際会議録
3. Metal contamination issues resulting from new Si processes
Benton, J. L. ; Boone, T. ; Jacobson, D.C. ; Lin, Wen ; Wilk, G.D. ; Krautter, H. W. ; Rosamilia, J.M. ; Rafferty, C.S.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany.  pp.181-191,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-29