1.

国際会議録
国際会議録
1. HF-IMMERSION INDUCTIVELY COUPLED CARRIER LIFETIME CHARACTERIZATION OF FURNACE-OXIDE GROWTH
Boone, T. ; Higashi, G. S. ; Benton, J. L. ; Kistler, R. C. ; Weber, G. R. ; Keller, R. C. ; Makris, G.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.359-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
2.

国際会議録
国際会議録
2. Metal contamination issues resulting from new Si processes
Benton, J. L. ; Boone, T. ; Jacobson, D.C. ; Lin, Wen ; Wilk, G.D. ; Krautter, H. W. ; Rosamilia, J.M. ; Rafferty, C.S.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany.  pp.181-191,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-29