1.

国際会議録
国際会議録
1. Preliminary study on systematic optimization of EPL mask infrastructure
Takase, H. ; Gomei, Y. ; Terashima, S. ; Kondo, H. ; Aoki, T. ; Matsunari, S. ; Niibe, M. ; Kakutani, Y.
出版情報: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.509-517,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5751
2.

国際会議録
国際会議録
2. EPL performance in 65-nm node metallization technology and beyond
Kakutani, Y. ; Niibe, M. ; Takase, H. ; Terashima, S. ; Kondo, H. ; Matsunari, S. ; Aoki, T. ; Gomei, Y. ; Fukuda, Y.
出版情報: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.501-508,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5751
3.

国際会議録
国際会議録
3. Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources
Aoki, T. ; Kondo, H. ; Matsunari, S. ; Takase, H. ; Gomei, Y. ; Terashima, S.
出版情報: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.563-571,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5751
4.

国際会議録
国際会議録
4. A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU
Kakutani, Y. ; Niibe, M. ; Kakiuchi, K. ; Takase, H. ; Terashima, S. ; Kondo, H. ; Matsunari, S. ; Aoki, T. ; Gomei, Y. ; Fukuda, Y.
出版情報: Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA.  pp.47-57,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5533
5.

国際会議録
国際会議録
5. Effect ofresidual gas atmosphere on lifetime of Ru-capped EUVl projection optics mirror [6151-17]
Kakutani, Y ; Nilbe, M. ; Gomei, Y. ; Talase, H. ; Terashima, S. ; Matsunari, S. ; Aoki, T. ; Murakami, K ; Fukuda, Y
出版情報: Emerging Lithographic Technologies X.  pp.61510H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6151