1.

国際会議録
国際会議録
1. Masks for flash memory gates for the 45nm node: binary or attenuated?
E. van Setten ; A. Engelen ; J. Finders ; M. Dusa
出版情報: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6533
2.

国際会議録
国際会議録
2. Imaging performance optimization for hyper-NA scanner systems in high volume production
M. van de Kerkhof ; E. van Setten ; A. Engelen ; V. Plachecki ; H. Liu
出版情報: Optical Microlithography XXI.  2  pp.69241W-1-69241W-13,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6924