Mask error enhancement-factor (MEEF) metrology using automated scripts in CATS
- 著者名:
- van Adrichem, P.J.M. ( Numerical Technologies, Inc. (Netherlands) )
- Driessen, F.A.J.M.
- van Hasselt, K. ( Philips Semiconductors (Netherlands) )
- Brueck, H.-J. ( MueTec GmbH (Germany) )
- 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 551
- 終了ページ:
- 557
- 総ページ数:
- 7
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |