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LOW-TEMPERATURE DEVICE-QUALITY SiO2/Si (100) INTERFACES PREPARED BY A COMBINED REMOTE PLASMA OXIDATION-DEPOSITION PROCESS

著者名:
掲載資料名:
Structure and properties of interfaces in materials : symposium held Decmber[i.e. December] 2-5, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
238
発行年:
1992
開始ページ:
713
終了ページ:
720
総ページ数:
8
出版情報:
Pittsburgh: Materials Research Society
ISSN:
02729172
ISBN:
9781558991323 [1558991328]
言語:
英語
請求記号:
M23500/238
資料種別:
国際会議録

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