1.

国際会議録
国際会議録
1. Characterization of gate electrode etch process for 0.25 ｦﾌm extended to 0.18 ｦﾌm
Gerung,H. ; Chhagan,V.K. ; Yelehanka,P.R. ; Zhou,M.S. ; Hui,J.K.L.
出版情報: Process and equipment control in microelectronic manufacturing : 19-20 May 1999, Edinburgh, Scotland.  pp.96-104,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3742
2.

国際会議録
国際会議録
2. Characterization of polymer formation during Si02 etching with different fluorocarbon gases (CHF3,CF4,C4F8)
Loong,S.Y. ; Lee,H.K. ; Chan,L.H. ; Zhou,M.S. ; Loh,F.C. ; Tan,K.L.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.376-382,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
3.

国際会議録
国際会議録
3. Characterization of pattern density and the metal stack composition on chlorine residues from the metal etch process
Loong,S.Y. ; Lee,H.K. ; Zhou,M.S. ; Chan,L.H. ; Premachandran,V.
出版情報: Multilevel Interconnect Technology II.  pp.170-180,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3508