1.

国際会議録
国際会議録
1. Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions
Colombeau, B. ; Smith, A.J. ; Cowern, N.E.B. ; Pawlak, B.J. ; Cristiano, F. ; Duffy, R. ; Claverie, A. ; Ortiz, C.J. ; Pichler, P. ; Lampin, E. ; Zechner, C.
出版情報: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.91-102,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 810
2.

国際会議録
国際会議録
2. Physics-Based Diffusion Simulations for Preamorphized Ultra-Shallow Junctions
Cowern, N. E. B. ; Colombeau, B. ; Lampin, E. ; Cristiano, F. ; Claverie, A. ; Lamrani, Y. ; Duffy, R. ; Venezia, V. ; Heringa, A. ; Wang, C. C. ; Zechner, C.
出版情報: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.199-204,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 765