1.

国際会議録
国際会議録
1. Properties of Amorphous Nitrogenated Carbon (a-C:H:N) Films Deposited in Electron Cyclotron Resonance Plasma
Hong, J. ; Bhattacharyya, S. ; Zarrabian, M. ; Turban, G.
出版情報: Proceedings of the Fifth International Symposium on Diamond Materials.  pp.608-618,  1997.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-32
2.

国際会議録
国際会議録
2. Plasma Deposition of Diamond-Like Carbon and Carbon-Nitride Films in an Electron Cyclotron Resonance-Radio Frequency Discharge
Turban, G. ; Zarrabian, M. ; Hong, J.
出版情報: Plasma deposition and treatment of polymers : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A..  pp.89-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 544
3.

国際会議録
国際会議録
3. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.415-422,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
4.

国際会議録
国際会議録
4. AltPSM inspection capability and printability of quartz defects
Heumann, J.P. ; Zarrabian, M. ; Hennig, M. ; Dettmann, W. ; Zurbrick, L.S. ; Lang, M.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
5.

国際会議録
国際会議録
5. Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results
Griesinger, U.A. ; Dettmann, W. ; Hennig, M. ; Heumann, J.P. ; Koehle, R. ; Ludwig, R. ; Verbeek, M. ; Zarrabian, M.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.410-421,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754