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The Influence of Fluorine on Various MOS Devices

著者名:
Innertsberger, G.
Jurk, R.
Felsner, J.
Kakoschke, R.
Yuwono, B.
Schlosser, T.
Krautschneider, W.
Gschwandtner, A.
さらに 3 件
掲載資料名:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
567
発行年:
1999
開始ページ:
589
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
言語:
英語
請求記号:
M23500/567
資料種別:
国際会議録

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