1.

国際会議録
国際会議録
1. Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography
Ganesan, R. ; Choi, J.-H. ; Yun, H.-J. ; Kwon, Y.-G. ; Kim, K.-S. ; Oh, T.-H. ; Kim, J.-B.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.40-51,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. Novel molecular resists based on inclusion complex of cyclodextrin
Kim, J.-B. ; Kwon, Y.-G. ; Yun, H.-J. ; Choi, J.-H.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.837-845,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Reconstruction and navigation of carotid artery based on ultrasonic volume data
Choi, Y.-J. ; Song, S.-M. ; Yun, H.-J. ; Kwak, B.-J. ; Kim, M.-H.
出版情報: Medical Imaging 2004: Ultrasonic Imaging and Signal Processing.  pp.352-362,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5373