HYDROGEN PLASMA CLEANING OF OXIDE PAlTERNED Si WAFERS FOR LOW TEMEPARATURE Si EPITAXY
- 著者名:
- 掲載資料名:
- Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-35
- 発行年:
- 1997
- 開始ページ:
- 307
- 終了ページ:
- 314
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771887 [1566771889]
- 言語:
- 英語
- 請求記号:
- E23400/97-35
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
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MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
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10
国際会議録
Chlorine Etching for In-Situ Low-Temperature Silicon Surface Cleaning for Epitaxy Applications
Electrochemical Society |
Electrochemical Society | |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |