1.

国際会議録
国際会議録
1. Analysis of resist pattern collapse and optimization of DUV process for patterning sub-0.20-ｦﾌm gate line
Yu,J.Y. ; Jeong,G.-M. ; Huh,H. ; Kim,J.J. ; Kim,S.-P. ; Jeong,J.-K. ; Kim,H.-S.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.880-889,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Optimal design of antireflective layer for DUV lithography and experimental results
Lee,S.G. ; Lee,K.-I. ; Seo,C.-K. ; Lee,J.-U. ; Choi,Y. ; Nam,B. ; Yu,J.Y. ; Jeong,J.-K.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.409-418,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049