1.

国際会議録
国際会議録
1. Hot-carrier degradation for deep-submicron N-MOSFETs introduced by back-end processing
Lie,D.Y.C. ; Xia,W. ; Yota,J. ; Joshi,A.B. ; Zwingman,R. ; Williams,R. ; Kerametlian,V. ; Cerney,D. ; Min,B.W. ; Kwong,D.L.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.258-267,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
2.

国際会議録
国際会議録
2. Integration of ICP high-density plasma CVD with CMP and its effects on planarity for sub-0.5-ｦﾌm CMOS technology
Yota,J. ; Brongo,M.R. ; Dyer,T.W. ; Rafftesaeth,K.P. ; Bondur,J.A.
出版情報: Microelectronic Device and Multilevel Interconnection Technology II.  pp.265-274,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2875