1.

国際会議録
国際会議録
1. PLEIADES: a subpicosecond Thomson x-ray source for ultrafast materials probing
Fittinghoff, D.N. ; Springer, P.T. ; Barty, C.P.J. ; Brown, W.J. ; Crane, J.K. ; Cross, R.R. ; Ditmire, T. ; Gibson, D.J. ; Hartemann, F.V. ; Sage, G.P.L. ; Rosenzweig, J.B. ; Slaughter, D. ; Streitz, F.H. ; Tremaine, A.M. ; Anderson, S.G. ; Kuba, J. ; Booth, R. ; Moriarty, J. ; McMahan, A. ; Cynn, H. ; Yoo, C.-S.
出版情報: Commercial and biomedical applications of ultrafast lasers III : 28-30 January 2003, San Jose, California, USA.  pp.101-111,  2003.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4978
2.

国際会議録
国際会議録
2. New chelation clean process for removing gallium from the focused-ion-beam repaired mask
Chen, S.-T. ; Lin, T.-Y. ; Yoo, C.-S.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.391-399,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
3.

国際会議録
国際会議録
3. Effect of mask pattern fidelity on 193-nm lithography performance
Cheng, C.C. ; Su, T.-L. ; Tsai, F.-G. ; Tsai, T.-H. ; Tu, C.-C. ; Yoo, C.-S.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.937-944,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
4.

国際会議録
国際会議録
4. Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
Lai, R. ; Hsu, L. ; Kung, C.H. ; Hung, J. ; Huang, W.H. ; Yoo, C.-S. ; Huang, Y.-T. ; Hsu, V.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1156-1167,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
5.

国際会議録
国際会議録
5. Photomask defect tracing, analysis, and reduction with chemically amplified resist process
Lin, C.-. ; Lai, R. ; Huang, W.H. ; Wang, B.C. ; Chen, C.Y. ; Kung, C.H. ; Yoo, C.-S. ; Chen, J.-J. ; Lee, S.-C.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.205-212,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130