1.

国際会議録
国際会議録
1. Highly accurate hybrid-OPC method for sub-60nm memory device [6156-42]
Yune, H.-S. ; Kim, C.-K. ; Ahn Y B ; Nam B H ; Yim D
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. The improvement of DOF for sub-1OOnm process by focus scan [6154-56]
Kim, J. C. ; Yang, H. J. ; Jeon J.-H ; Park C.-H ; Moon, J ; Yim D ; Kim J. W ; Tseng S ; Rhe K.-K ; Min Y.-H ; Chen A C
出版情報: Optical Microlithography XIX.  pp.61541K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
3.

国際会議録
国際会議録
3. How to obtain accurate resist simulations in very low-kl era- [6154-107]
Chiou T. B ; Park C. H ; Choi, J. S ; Min Y.-H ; Hansen S ; Tseng S. E ; Chen A C ; Yim D
出版情報: Optical Microlithography XIX.  pp.61542V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154