1.

国際会議録
国際会議録
1. Channel Cracking Technique for Toughness Measurement of Brittle Dielectric Thin Films on Silicon Substrates
Ma, Qing ; Xie, Joseph ; Chao, Sam ; El-Mansy, Safaa ; McFadden, Robert ; Fujimoto, Harry
出版情報: Materials reliability in microelectronics VIII : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.331-,  1998.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 516
2.

国際会議録
国際会議録
2. Effects Of A Thin Flash Copper Layer On The Diffusion Of Cu, Ta, Si, And O In The Cu/TaN/SiO2/Si Structures
Loh, S.W. ; Zhang, D.H. ; Li, C.Y. ; Liu, R. ; Wee, A.T.S. ; Foo, P.D. ; Xie, Joseph ; Prasad, K. ; Tan, C.M. ; Lee, Y.K.
出版情報: Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology.  pp.116-122,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-17