1.

国際会議録
国際会議録
1. Imdependent tunneling reductions relative to homogeneous oxide dielectrics from i)Nitrided interfaces, and ii) Physically-thicker stacked oxide/nitride and oxide/oxynitride gate dielectrics
Lucovsky, Gerry ; Wu, Yider ; Lee, Yi-Mu ; Yang, Hanyang ; Niimi, Hiro
出版情報: Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.317-,  2000.  Warrendale, PA.  MRS-Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 592
2.

国際会議録
国際会議録
2. Degradation And Silc Effects Of Rpecvd Sub-2.0Nm Oxide/Nitride (O/N) And Oxynitride Dielectrics Under Constant Current Stress
Lee, Yi-Mu ; Wu, Yider ; Hong, Joon Goo ; Lucovsky, Gerald
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.103-108,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716