1.

国際会議録
国際会議録
1. Lithographic tradeoffs between different assist feature OPC design strategies
Word, J.C. ; Zhu, S.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.293-304,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
2.

国際会議録
国際会議録
2. Investigation of product design weaknesses using model-based OPC sensitivity analysis
Postnikov, S.V. ; Lucas, K. ; Garza, C.M. ; Wimmer, K. ; LaCour, P. ; Word, J.C.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.160-171,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
3.

国際会議録
国際会議録
3. Contact-hole MEEF comparison between ALTA and 50-KeV written masks
Sturtevant, J.L. ; Opitz, J. ; Word, J.C.
出版情報: Optical Microlithography XVI.  Part Two  pp.1055-1061,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
4.

国際会議録
国際会議録
4. Assist feature OPC implementation for the 130-nm technology node with KrF and no forbidden pitches
Word, J.C. ; Zhu, S. ; Sturtevant, J.L.
出版情報: Optical Microlithography XV.  Part Two  pp.1139-1147,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
5.

国際会議録
国際会議録
5. Reduction of reflective notching through illumination optimization
Word, J.C. ; Chou, D. ; Gu, Y. ; Sturtevant, J.L.
出版情報: Optical Microlithography XV.  Part Two  pp.990-998,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
6.

国際会議録
国際会議録
6. Model-based prediction of full-chip SRAF printability
Word, J.C. ; Zhu, S.
出版情報: Optical Microlithography XVII.  pp.1105-1111,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377