1.

国際会議録
国際会議録
1. Recent developments in spectroscopic ellipsometry for in-situ applications
Johs,B.D. ; Hale,J. ; Ianno,N.J. ; Herzinger,C.M. ; Tiwald,T.E. ; Woollam,J.A.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.41-57,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
2.

国際会議録
国際会議録
2. Infrared spectroscopic ellipsometry for nondestructive characterization of free-carrier and crystal-structure properties of group-？-nitride semiconductor device heterostructures
Schubert,M. ; Kasic,A. ; Figge,S. ; Diesselberg,M. ; Einfeldt,S. ; Hommel,D. ; Kohler,U. ; As,D.J. ; Off,J. ; Kuhn,B. ; Scholz,F. ; Woollam,J.A. ; Herzinger,C.M.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.58-68,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
3.

国際会議録
国際会議録
3. Variable angle spectroscopic ellipsomefry in the vacuum ultraviolet
Woollam,J.A. ; Hilfiker,J.N. ; Tiwald,T.E. ; Bungay,C.L. ; Synowicki,R.A. ; Meyer,D.E. ; Herzinger,C.M. ; Pfeiffer,G.L. ; Cooney,G.T. ; Green,S.E. ; Co,J.A.Woollam
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA.  pp.197-205,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4099
4.

国際会議録
国際会議録
4. Diamondlike Carbon Applications in Infrared Optics and Microelectronics
Woollam,J.A. ; De,B.N. ; Orzeszko,S. ; Ianno,N.J. ; Snyder,P.G. ; Alterovitz,S.A. ; Pouch,J.J. ; Wu,R.L.C. ; Ingram,D.C.
出版情報: Properties and characterization of amorphous carbon films.  pp.577-608,  1990.  Zurich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 52-53
5.

国際会議録
国際会議録
5. Self-calibrating modulation ellipsometer
Ducharme,S. ; Machlab,H. ; Snyder,P.G. ; Woollam,J.A. ; Synowicki,R.A.
出版情報: Fiber optic and laser sensors XIV : 7-9 August 1996, Denver, Colorado.  pp.373-384,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2839
6.

国際会議録
国際会議録
6. Real-time monitoring and control during MBE growth of GaAs/AIGaAs Bragg reflectors using multiwave ellipsometry
Wagner,T. ; Johs,B.D. ; Herzinger,C.M. ; He,P. ; Pittal,S. ; Woollam,J.A.
出版情報: Polarimetry and ellipsometry : 20-23 May, 1996, Kazimierz Dolny, Poland.  pp.301-307,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3094
7.

国際会議録
国際会議録
7. Application of generalized ellipsometry to complex optical systems
Schubert,M. ; Rheinlander,B. ; Woollam,J.A. ; Johs,B.D. ; Herzinger,C.M.
出版情報: Polarimetry and ellipsometry : 20-23 May, 1996, Kazimierz Dolny, Poland.  pp.255-265,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3094
8.

国際会議録
国際会議録
8. In-situ monitor and control using fast spectroscopic ellipsometry
Woollam,J.A. ; Gao,X. ; Heckens,S. ; Hilfiker,J.N.
出版情報: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.140-143,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2873