1.

国際会議録
国際会議録
1. Remote Plasma-Enhanced-Metal Organic Chemical Vapor Deposition of Zirconium Oxide/Silicon Oxide Alloy, (ZrO2)x-(SiO2)1-x (x ｡？0.5), Thin Films for Advanced High-K Gate Dielectrics
Wolfe, D. ; Flock, K. ; Therrien, R. ; Johnson, R. ; Rayner, B. ; Gunther, L. ; Brown, N. ; Claflin, B. ; Lucovsky, G.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.343-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
2.

国際会議録
国際会議録
2. Production of Silicon Nanocrystals by Thermal Annealing of Silicon-Oxygen and Silicon-Oxygen-Carbon Alloys: Model Systems for Chemical and Structural Relaxation at Si-SiO2 and SiC-SiO2 Interfaces
Lucovsky, G. ; Wolfe, D. ; Hinds, B.
出版情報: Microcrystalline and nanocrystalline semiconductors--1998 : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A..  pp.111-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 536
3.

国際会議録
国際会議録
3. Integrated Two-Stage Processing of Microcrystalline Silicon Thin Films on SiO2 and Glass
Wolfe, D. ; Wang, F. ; Lucovsky, G.
出版情報: Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.361-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 429
4.

国際会議録
国際会議録
4. Substrate Surface Dependence of the Microstructure of ｦﾌc-Si,Ge:H Deposited by Reactive Magnetron Sputtering (RMS)
Cho, S. M. ; Christensen, K. ; Wolfe, D. ; Ying, H. ; Lee, D. R. ; Lucovsky, G. ; Maher, D. M.
出版情報: Surface/interface and stress effects in electronic material nanostructures : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.241-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 405
5.

国際会議録
国際会議録
5. DEPOSITION OF MICROCRYSTALLINE Si,Ge (ｦﾌc-Si,Ge) ALLOYS BY REACTIVE MAGNETRON SPUTTERING
Cho, S. M. ; Wolfe, D. ; He, S. S. ; Christensen, K. ; Maher, D. M. ; Lucovsky, G.
出版情報: Microcrystalline and nanocrystalline semiconductors : Symposium held November 29-December 2, 1994, Boston, Massachusetts, U.S.A..  pp.781-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 358
6.

国際会議録
国際会議録
6. Electric and Optical Properties of ｦﾌc-Si,Ge:H Alloys Deposited by Reactive Magnetron Sputtering (RMS)
Cho, S. M. ; Wolfe, D. ; Christensen, K. ; Lucovsky, G. ; Maher, D. M.
出版情報: Polycrystalline thin films II : structure, properties, and applications : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.471-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 403