1.

国際会議録
国際会議録
1. Re-evaluating simple lambda-based design rules for low-K1 lithography process control
Postnikov,S.V. ; Lucas,K.D. ; Roman,B.J. ; Wimmer,K.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.901-912,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
2.

国際会議録
国際会議録
2. Impact of photoresist taper and implant tilt angle on the interwell isolation of subquartermicron CMOS technologies
Gilbert,P. ; Grant,J. ; Tsui,P. ; King,C. ; Taylor,W. ; Wimmer,K.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.228-235,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
3.

国際会議録
国際会議録
3. Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography
Postnikov,S.V. ; Lucas,K. ; Wimmer,K.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.797-808,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344