High Rate Deposition of Cluster-Suppressed Amorphous Silicon Films Deposited Using a Multi-Hollow Discharge Plasma CVD
- 著者名:
- 掲載資料名:
- Photovoltaic materials and manufacturing issues II : symposium held November 29-December 3, Boston, Massachusetts, U.S.A
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 1210
- 発行年:
- 2010
- 開始ページ:
- 217
- 終了ページ:
- 222
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605111834 [160511183X]
- 言語:
- 英語
- 請求記号:
- M23500/1210
- 資料種別:
- 国際会議録
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