1.

国際会議録
国際会議録
1. Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform
Kim,K. ; Wells,G.M. ; Kim,W.D. ; Choi,Y.-J. ; Choi,S.-J. ; Kim,Y.-S. ; Kim,D.-B.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.168-178,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
2.

国際会議録
国際会議録
2. Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners
Terry,M. ; Lalovic,I. ; Wells,G.M. ; Smith,A.H.
出版情報: Optical Microlithography XIV.  4346  pp.15-24,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346