A dual-function UHV-Compatible chamber for (i) low-temperature plasma-assisted oxidation, and (ii) high-temperature rapid thermal processing of Si-based dielelctric gate heterostructures
- 著者名:
Hattangady, S. Xu, X-L Watkins, M. J. Hornung, B. Misra, V. Lucovsky, G. Wortman, J. J. - 掲載資料名:
- III-V electronic and photonic device fabrication and performance : symposium held April 12-15, 1993, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 300
- 発行年:
- 1993
- 開始ページ:
- 581
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991965 [1558991964]
- 言語:
- 英語
- 請求記号:
- M23500/300
- 資料種別:
- 国際会議録
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