New UV-capable photomask CD metrology tool

New UV-capable photomask CD metrology tool

著者名:

Schlueter, G. ( Leica Microsystems Wetzlar GmbH (Germany) )

Brueck, H. -J. ( MueTec GmbH (Germany) )

Birkenmayer, S. ( MueTec GmbH (Germany) )

Falk, G. ( MueTec GmbH (Germany) )

Scheuring, G. ( MueTec GmbH (Germany) )

Walden, L. ( MueTec GmbH (Germany) )

Lehnigk, S. ( Submicron Technologies GmbH (Germany) )

さらに 2 件

掲載資料名:

Photomask and X-Ray Mask Technology VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3748

発行年:

1999

開始ページ:

592

終了ページ:

598

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

言語:

英語

請求記号:

P63600/3748

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014623
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1999 : 6th
会議開催地:	Yokohama, Japan
会議開催年:	1999.04.13-1999.04.14

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