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Spacer double patterning technique for sub-40nm DRAM manufacturing process development

著者名:
  • W. Shiu ( Nanya Technology Corp., Taiwan )
  • W. Ma ( Nanya Technology Corp., Taiwan )
  • H. W. Lee ( Nanya Technology Corp., Taiwan )
  • J. S. Wu ( Nanya Technology Corp., Taiwan )
  • Y. M. Tseng ( Nanya Technology Corp., Taiwan )
掲載資料名:
Lithography Asia 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7140
発行年:
2008
巻:
2
開始ページ:
71403Y-1
終了ページ:
71403Y-8
総ページ数:
8
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
言語:
英語
請求記号:
P63600/7140
資料種別:
国際会議録

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