1.

国際会議録
国際会議録
1. Inspection of integrated circuit databases through reticle and wafer simulation: an integrated approach to design for manufacturing(DFM)
Howard, W. ; Tirapu Azpiroz, J. ; Xiong, Y. ; Mack, C. ; Verma, G. ; Volk, W. ; Lehon, H. ; Deng, Y. ; Shi, R. ; Culp, J. ; Mansfield, S.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.61-72,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
2.

国際会議録
国際会議録
2. Polysilicon gate and polysilicon wire CD/EPE defect detection and classification through process window [6349-198]
Andrews, S. ; Volk, W. ; Su, B. ; Du, H. ; Kumar, B. ; Pulusuri, R. ; Vikram, A. ; Li, X. ; Chen, S.
出版情報: Photomask Technology 2006.  pp.634932-634932,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6349
3.

国際会議録
国際会議録
3. Applying reconfigurable RET across process window to create more robust manufacturing designs [5992-70]
Laurance, M. ; Vikram, A. ; Ma, M. ; Volk, W. ; Anderson, M. ; Andrews, S. ; Su, B. ; Hu, D. ; Verma, G.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921X-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
4.

国際会議録
国際会議録
4. High-resolution UV wavelength reticle contamination inspection
Kalk, F. D. ; Volk, W. ; Wiley, J. N. ; Hou, E. ; Watson, S.
出版情報: Photomask and X-Ray Mask Technology VI.  pp.513-519,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3748
5.

国際会議録
国際会議録
5. Lithography process window enhancement using integrated design defect detection and fix [6283-100]
Su, B. ; Ma, M. ; Vikram, A. ; Volk, W. ; Du, H. ; Verma, G. ; Morse, R. ; Chu, C. ; Tsao, B. ; Lin, C. ; Chou, J. ; Tsai, S.
出版情報: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6283
6.

国際会議録
国際会議録
6. Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
Hsu, S. ; Chu, T. -B. ; Van Den Broeke, D. ; Chen, J. F. ; Hsu, M. ; Corcoran, N. P. ; Volk, W. ; Ruch, W. E. ; Sier, J. -P. ; Hess, C. E. ; Lin, B. ; Yu, C. C. ; Huang, G.
出版情報: 24th Annual BACUS Symposium on Photomask Technology.  pp.711-722,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5567