1.

国際会議録
国際会議録
1. Characterization of NF3 Chamber Cleans on Multiple CVD Platforms
Goolsby, B. ; Vartanian, V. ; Mendicino, L. ; Rivers, J. ; Vires, J. ; Soyemi, A. ; Sun, S.P. ; Turner, M. ; Esber, C.
出版情報: Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium.  pp.127-138,  2002.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-15
2.

国際会議録
国際会議録
2. Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films
Edwards, N.V. ; Vella, J. ; Xie, Q. ; Zollner, S. ; Werho, D. ; Adhihetty, I. ; Liu, R. ; Tiwald, T.E. ; Russell, C. ; Vires, J. ; Junker, K.H.
出版情報: Surface engineering 2001 - fundamentals and applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A..  pp.101-106,  2002.  Warrendale, Penn.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 697
3.

国際会議録
国際会議録
3. Fate of Fluorine Emissions from NF3-Based CVD Chamber Cleaning Process
Vartanian, V. ; Goolsby, B. ; Mendicino, L. ; Brown, PT. ; Vires, J. ; Raley, D. Babbittand B.
出版情報: Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries : proceedings of the fourth International Symposium.  pp.78-93,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-6