1.

国際会議録
国際会議録
1. Developing a method to determine linewidth based on counting the atom spacings across a line
Silver,R.M. ; Jensen,C.P. ; Tsai,V.W. ; Fu,J. ; Villarrubia,J.S. ; Teague,E.C.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.441-460,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
2.

国際会議録
国際会議録
2. Strategy for faster blind reconstruction of tip geometry for scanned probe microscopy
Villarrubia,J.S.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.10-18,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
3.

国際会議録
国際会議録
3. Grating pitch measurements with the molecular measuring machine
Kramar,J. ; Jun,J.S. ; Penzes,W.B. ; Scire,F. ; Teague,E.C. ; Villarrubia,J.S.
出版情報: Recent advances in metrology, characterization, and standards for optical digital data disks : 21-22 July 1999, Denver, Colorado.  pp.46-53,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3806
4.

国際会議録
国際会議録
4. Is a production-level scanning electron microscope linewidth standard possible?
Postek,M.T. ; Vladar,A.E. ; Villarrubia,J.S.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.42-56,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
5.

国際会議録
国際会議録
5. Linewidth measurement intercomparison on a BESOI sample
Villarrubia,J.S. ; Vladar,A.E. ; Lowney,J.R. ; Postek,M.T. ; Allen,R.A. ; Cresswell,M.W. ; Ghoshtagore,R.N.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.84-95,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
6.

国際会議録
国際会議録
6. Edge determination for polycrystalline silicon lines on gate oxide
Villarrubia,J.S. ; Vladar,A.E. ; Lowney,J.R. ; Postek Jr.,M.T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.147-156,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
7.

国際会議録
国際会議録
7. Electrical test structures replicated in silicon-on-insulator material
Cresswell,M.W. ; Sniegowski,J.J. ; Ghoshtagore,R.N. ; Allen,R.A. ; Linholm,L.W. ; Villarrubia,J.S.
出版情報: Metrology, Inspection, and Process Control for Microlithography X.  pp.659-676,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2725