1.

国際会議録
国際会議録
1. *CHARACTERIZATION AND CONTROL OF WAFER CHARGING EFFECTS DURING HIGH-CURRENT ION IMPLANTATION
Current, M.I. ; Lucaszek, W. ; Dixon, W. ; Vella, M.C. ; Messick, C. ; Shideler, J. ; Reno, S.
出版情報: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III.  pp.49-58,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-9
2.

国際会議録
国際会議録
2. Sub-Parts-Per-Quadrillion Sensitivity to Contaminants in Ultra-Pure Silicon via Low-Background Instrumental Neutron Activation Analysis
McDonald, R.J. ; Smith, A.R. ; Hurley, D.L. ; Norman, E.B. ; Vella, M.C.
出版情報: Proceedings of the Fourth International Symposium on High Purity Silicon.  pp.554-565,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-13