1.

国際会議録
国際会議録
1. Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
Kocsis, M. ; Van Den Heuvel, D. ; Gronheid, R. ; Maenhoudt, M. ; Vangoidsenhoven, D. ; Wells, G. ; Stepanenko, N. ; Benndorf, M. ; Kim, H. W ; Kishimura, S. ; Ercken, M. ; Van Roey, F. ; O’Brien, S. ; Fyen, W. ; Foubert, P ; Moerman, R ; Streefkerk, B.
出版情報: Optical Microlithography XIX.  pp.615409-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
2.

国際会議録
国際会議録
2. The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
Holsteyns, F. ; Cheung, L. ; Van Den Heuvel, D. ; Marcuccilli, G ; Simposon, G. ; Brun, R. ; Steinbach, A.. ; Fyen, W. ; Vangoidsenhoven, D. ; Merten, P. ; Maenhoudt, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152