Posseme, N. ; Chevolleau, T. ; Valuer, L. ; Joubert, O.
出版情報:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.66-72, 2003. Pennington, N.J.. Electrochemical Society
Pargon, E. ; Joubert, O. ; Posseme, N ; Valuer, L.
出版情報:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.47-58, 2003. Pennington, N.J.. Electrochemical Society
Chevolleau, T. ; Joubert, O. ; Posseme, N. ; Valuer, L. ; Thomas-Boutherin, I.
出版情報:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.40-46, 2003. Pennington, N.J.. Electrochemical Society
Le Roux, V. ; Machicoane, G. ; Borsoni, G. ; Korwin-Pawlowski, M. ; Bechu, N. ; Kerdiles, S. ; Laffitte, R. ; Valuer, L. ; Roman, P. ; Wu, C.-T. ; Ruzyllo, J.
出版情報:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.249-257, 2001. Pennington, N.J.. Electrochemical Society
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