1.

国際会議録
国際会議録
1. Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology
Tzu, S.-D. ; Chang, C.-H. ; Chen, W.-C. ; Kliem, K.-H. ; Hudek, P. ; Beyer, D.
出版情報: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.100-108,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5645
2.

国際会議録
国際会議録
2. Defect dispositiong using mask printability analysis on alternating phase-shifting masks
Chang, C.-H. ; Hsieh, C.-H. ; Tzu, S.-D. ; Dai, C.-M. ; Lin, B. J. ; Pang, L. ; Qian, Q.-D. ; Chen, J.-H. ; Huang, J. H.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.622-629,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754