1.

国際会議録
国際会議録
1. 65-nm full-chip implementation using double dipole lithography
Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.
出版情報: Optical Microlithography XVI.  Part One  pp.215-231,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
2.

国際会議録
国際会議録
2. Defect printability analysis study using virtual stepper system in a production environment
Chiou, S.Y. ; Lei, H. ; Liu, W.J. ; Chu, M.J. ; Chiang, D. ; Tuan, S. ; Hong, C.-L. ; Chang, M. ; Chen, J.-H. ; Chan, K.K. ; Qian, Q.-D. ; Cai, L. ; Pang, L.Y.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.23-34,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
3.

国際会議録
国際会議録
3. Process of manufacturing and inspection of high-end (ternary) tritone EAPSM reticles for 0.13-μm design rule generation
Tuan, S. ; Gottlib, G. ; Rosenbusch, A.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.422-427,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
4.

国際会議録
国際会議録
4. Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET
Shieh, W.B. ; Chou, W. ; Yang, C.-H. ; Wu, J.K. ; Chen, N. ; Yen, S.M. ; Hsu, T. ; Tuan, S. ; Chang, D. ; Rudzinski, M.W. ; Wang, L. ; Son, K.
出版情報: Optical Microlithography XVII.  pp.1047-1058,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377
5.

国際会議録
国際会議録
5. Evaluation, reduction, and monitoring of progressive defects on 193-nm reticles for low-k1 process
Shiao, C.H. ; Tsai, C.-C. ; Hsu, T. ; Tuan, S. ; Chang, D. ; Chen, R. ; Hsieh, F.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.225-230,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446