Ultra-High-Speed and Low-Power SOI CMOS Technology with Body-Tied Hybrid Trench Isolation Structure
- 著者名:
Hirano, Y. Ipposhi, T. Thai, D. H. Iwamatsu, T. Ikeda, T. Tsujiuchi, M. Maegawa, S. Inuishi, M. Ohji, Y. - 掲載資料名:
- Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2004-04
- 発行年:
- 2004
- 開始ページ:
- 60
- 終了ページ:
- 64
- 総ページ数:
- 5
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774178 [1566774179]
- 言語:
- 英語
- 請求記号:
- E23400/200404
- 資料種別:
- 国際会議録
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3
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High-performance metal-gate SOI CMOS fabricated by ultraclean low-temperature process technologies
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