1.

国際会議録
国際会議録
1. Automatic parallel optical proximity correction and verification system
Watanabe,T. ; Tsujimoto,E. ; Nakajo,K. ; Maeda,K.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1015-1023,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
2.

国際会議録
国際会議録
2. Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks
Nakajo,K. ; Sakemi,J. ; Moniwa,A. ; Terasawa,T. ; Hasegawa,N. ; Tsujimoto,E.
出版情報: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.154-162,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3096
3.

国際会議録
国際会議録
3. Hierarchical mask data design system (PROPHET) for aerial image simulation,automatic phase-shifter placement,and subpeak overlap checking
Tsujimoto,E. ; Watanabe,T. ; Sato,Y. ; Moniwa,A. ; Igarashi,Y. ; Nakajo,K.
出版情報: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.163-172,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3096
4.

国際会議録
国際会議録
4. Automatic parallel optical proximity correction system for application with hierarchical data structure
Tsujimoto,E. ; Watanabe,T. ; Nakajo,K.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.675-685,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
5.

国際会議録
国際会議録
5. Detection of 60｡? phase defects on alternating PSMs
Spence,C.A. ; Emery,D. ; Zurbrick,L.S. ; Prakash,D.P. ; Chang,X. ; Khanna,S. ; Leback,B. ; Tsujimoto,E. ; Hughes,G.P. ; Yang,B.
出版情報: Photomask and X-Ray Mask Technology V.  pp.480-495,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3412
6.

国際会議録
国際会議録
6. Application of automatic parallel fracturing system on hierarchical and large data structure
Tsujimoto,E. ; Watanabe,T. ; Katabuchi,K. ; Nogami,A. ; Shibayama,S. ; Sambayashi,H. ; Takaku,S. ; Takase,N.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.704-713,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562
7.

国際会議録
国際会議録
7. Detection of submicron phase defects on multiphase random logic reticles
Spence,C.A. ; Nistler,J.L. ; Arnold,W.H. ; Emery,D. ; Zurbrick,L.S. ; Prakash,D.P. ; Chang,X. ; Khanna,S. ; Leback,B. ; Tsujimoto,E. ; Hughes,G.P.
出版情報: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.228-242,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3236