1.

国際会議録
国際会議録
1. AN ASSESSMENT OF ECR ARGON PLASMA ETCHING DAMAGE ON Si AND SiO2 INTERFACES
Nam, C. W. ; Ashok, S. ; Tsai, W. ; Day, M.E.
出版情報: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.861-868,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 279
2.

国際会議録
国際会議録
2. PLASMA DIAGNOSTICS AND MODELING OF Ti/Tn REACTIVE SPUTTERING
Tsai, W. ; Fair, J. ; Hodul, D.
出版情報: Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A..  pp.793-798,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 260
3.

国際会議録
国際会議録
3. 32 Metal Gated Self-aligned Gate-forward nMOSFET with 〓0.8 nm EOT Fabricated by In-Situ Ar/O2 Plasma Oxidation of PVD Hf
Koveshnikov, S. ; Tsai, W. ; Zhang, M. ; Choi, C. ; Lee, J.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.274-281,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
4.

国際会議録
国際会議録
4. Highly Selective Etch of SiO2 for High Aspect Ratio Sub-0.5 um Holes
Zhu, H. ; Mueller, G. ; Nguyen, T. ; Tsai, W.
出版情報: Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes.  pp.115-120,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-30
5.

国際会議録
国際会議録
5. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
出版情報: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-2
6.

国際会議録
国際会議録
6. INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING
De Gendt, S. ; Beckx, S. ; Caymax, M. ; Claes, M. ; Conard, T. ; Delabie, A. ; Deweerd, W. ; Hellin, D. ; Kraus, H. ; Onsia, B. ; Parishev, V. ; Puurunen, R. ; Rohr, E. ; Snow, J. ; Tsai, W. ; Van Doome, P. ; Van Elshocht, S. ; Vertommen, J. ; Witters, T. ; Heyns, M.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.67-77,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
7.

国際会議録
国際会議録
7. Simulation of Uniformity and Lifetime Effects in Collimated Sputtering
Tait, R. N. ; Dew, S. K. ; Tsai, W. ; Hodul, D. ; Brett, M. J. ; Smy, T.
出版情報: Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.107-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 387
8.

国際会議録
国際会議録
8. EFFECTS OF LOW-TEMPERATURE SURFACE CLEANING USING ECR HYDROGEN PLASMA
Nam, C. W. ; Ashok, S. ; Tsai, W. ; Day, M. E.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.279-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
9.

国際会議録
国際会議録
9. Simulation of Uniformity and Lifetime Effects in Collimated Sputtering
Tait, R. N. ; Dew, S. K. ; Tsai, W. ; Hodul, D. ; Brett, M. J. ; Smy, T.
出版情報: Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.373-,  1995.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 389
10.

国際会議録
国際会議録
10. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
出版情報: Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.145-152,  2003.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 747