1.

国際会議録
国際会議録
1. THE BEHAVIOUR OF OXYGEN IN OXYGENATED N-TYPE HIGH-RESISTIVITY FLOAT-ZONE SILICON
Simoen, E. ; Claeys, C. ; Job, R. ; Ulyashin, A.G. ; Fahrner, W.R. ; Tonelli, G. ; Degryse, O. ; Clauws, P.
出版情報: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.912-924,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-2
2.

国際会議録
国際会議録
2. Diagnostic Tools and Characterisation Techniques for Large Area Integrated Capacitors on High Resistivity Microstrip Detectors
Lucchetti, D. ; Bozzi, C. ; Dell'Orso, R. ; Messineo, A. ; Tonelli, G. ; Verdini, P.G. ; Wheadon, R. ; Della Marina, R. ; Weiss, P. ; Diligenti, A. ; Nannini, A.
出版情報: Proceedings of the Fifth International Symposium on High Purity Silicon V.  pp.456-468,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-13
3.

国際会議録
国際会議録
3. THE BEHAVIOUR OF OXYGEN IN OXYGENATED N-TYPE HIGH-RESISTIVITY FLOAT-ZONE SILICON
Simoen, E. ; Claeys, C. ; Job, R. ; Ulyashin, A.G. ; Fahrner, W.R. ; Tonelli, G. ; Degryse, O. ; Clauws, P.
出版情報: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.912-926,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-2
4.

国際会議録
国際会議録
4. Doping Of Oxidized Float Zone Silicon By Thermal Donors - A Low Thermal Budget Doping Method For Device Applications?
Job, R. ; Ulyashin, A.G. ; Huang, Y.L. ; Fahrner, W.R. ; Simoen, E. ; Claeys, C. ; Niedernostheide, F.-J. ; Schulze, H.-J. ; Tonelli, G.
出版情報: Defect and impurity engineered semiconductors and devices III : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.257-262,  2002.  Warrendale, Pa.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 719
5.

国際会議録
国際会議録
5. A Low Temperature Technology on the Base of Hydrogen Enhanced Thermal Donor Formation for Future High-Voltage Applications
Job, R. ; Ulyashin, A.G. ; Fahrner, W.R. ; Niedernostheide, F.J. ; Schulze, H.J. ; Simoen, E. ; Claeys, C.L. ; Tonelli, G.
出版情報: Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001).  VOL-1  pp.405-413,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4746